Advanced Approach
to MOCVD Systems

Process support, maintenance, lifecycle services, and long‑term technology initiatives grounded in cleanroom reality: stability, uptime, and repeatability.

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MOCVD / ALD Expertise & Services

Focused, practical support for advanced deposition environments—built for fab constraints and production expectations.

Process Support

Optimization of growth parameters, yield improvement, and process stabilization for advanced semiconductor applications.

Hardware Maintenance

Preventive servicing, diagnostics, and lifecycle support for MOCVD and ALD systems.

Spare Parts & Replacement

Supply and coordination of critical components and consumables to minimize downtime.

Complementary Hardware Selection

Guidance in selecting auxiliary systems including gas handling, exhaust, and automation modules.

Facility Planning & Installation

Support in infrastructure planning, cleanroom integration, and equipment installation.

Facility Operation Service

Operational assistance to ensure process stability and efficient equipment utilization.

MOCVD Foundry

Pilot‑scale epitaxial growth services for prototyping and early‑stage production.

Supported MOCVD Systems

Epistromo provides service & support for Taiyo Nippon Sanso (TNSC) MOCVD platforms. Overview by reactor family.

UR Series — GaN (Mass Production)

High‑throughput GaN platforms for production environments.

SR Series — GaN (R&D / Small‑Scale Production)

Development and pilot‑line GaN reactors.

HR Series — GaAs / InP (Research & Mass Production)

Platforms for GaAs/InP and related III‑V materials.

BRC / BMC Series — GaAs / InP (Research & Mass Production)

GaAs/InP reactor families for research to production configurations.

FR Series — Ga2O3 (Research / Small‑Scale Production)

Platforms for Ga2O3 and related alloys.

Contact us View TNSC product line

300 mm Concept

EPISTROMO is participating in a technological initiative centered on the concept of an industrial 300 mm MOCVD platform featuring a dual-reactor architecture.

300mm 2x‑chamber MOCVD Platform

EPISTROMO is participating in a technological initiative centered on the concept of an industrial 300 mm MOCVD platform featuring a dual‑reactor architecture.

The proposed concept is focused on:

  • Increasing epitaxial throughput
  • Enhancing process flexibility
  • Reducing cost per wafer
  • Ensuring scalability for high‑volume manufacturing

Discussions may include:

  • Consortium participation
  • Coordinated technology initiatives
  • Long‑term alignment within the 300 mm segment

For further information and to explore possible forms of engagement, interested parties are invited to contact us directly.

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Industry News

Short, high‑signal updates focused on operations, process engineering, and long‑wafer platform readiness.

Jan 2026
Dual‑reactor 300 mm scaling: current evaluation status
A concise summary of architecture trade‑offs, throughput targets, and fab integration constraints.
Read more →
Dec 2025
Thermal uniformity strategies for large‑wafer epitaxy
Notes on modeling, measurement, and practical countermeasures under real tool constraints.
Discuss →
Nov 2025
Uptime playbook: preventive maintenance and critical spares
A checklist‑style approach to reduce unplanned downtime and stabilize process windows.
Related services →

MOCVD Community

A focused knowledge space for engineers and operators: processes, tool behavior, facilities, and the transition to larger wafers.

Featured Technical Note

Clean, searchable notes and checklists designed for day‑to‑day use in labs and fabs—calibration, troubleshooting, and stability workflows.

Latest Discussions

Thermal uniformity approaches for large wafers
Process
12 replies • last activity 2d ago
Best practices: gas handling, exhaust, and safety checks
Facility
8 replies • last activity 4d ago
Maintenance routines to improve uptime (MOCVD / ALD)
Ops
5 replies • last activity 1w ago

Why Epistromo

We combine service‑driven expertise with a long‑term technology direction in advanced deposition systems. Our work is grounded in cleanroom reality: process stability, uptime, and repeatable outcomes.

Contact Us

Reach out to discuss services, technical support, or engagement related to the 300 mm dual‑reactor platform concept.

8001, Burgas, Bulgaria